Experimental apparatus in Yoshinobu Lab. @ISSP

updated on 25 May, 2011

1. PES 2. STM-IRAS 3. HR-PES at PF 4. UHV-AFM/STM 5. HREELS 6. IRAS &SPA-LEED
7. VT-STM (SPECS150) 8. LT-STM(Createc) 9. 4-probe method


1. Photoelectron spectroscopy (A378)

VG-SCIENTA R3000 with UV and X-ray sources, LEED, QMS, H-beam doser etc.
Sample temperature=20K~1200K.
Recently VG-SCIENTA R3000 has been introduced as an electron spectrometer, and now ARPES can be measured as well as UPS and XPS.

研究対象:金属,半導体,有機薄膜などの光電子分光(ARPES, UPS, XPS)


2. Low temperature STM and IRAS (A037)
Low temperature STM (Unisoku), IRAS (JASCO 620V), LEED, QMS etc.
Sample temperature=~6K(liq. He), ~78K(liq N2), ~300K(room temperature)

研究対象:遷移金属ステップ面の吸着分子の吸着,拡散,反応.


3. LEED and PES system @ KEK-PF-BL13A
Varian LEED and Phoibos100
Sample temperature=30~1500K

Objective: High resolution photoelectron spectroscopy for valence and core-level. At PF BL13A (undulator), the photon energy range: 30-1200 eV. E/ΔE = 10,000 at 400 eV.


4. UHV AFM/STM (A037)
JEOL UHV-AFM/STM, CMA for Auger, etc.
Sample temperature=40K~900K

研究対象:有機分子/Si表面ハイブリッド系など.


5. HREELS (A036)
HREELS (LK5000: >1meV resolusion), LEED&AES, QMS, etc.
Sample temperature=30K~1200K

研究対象:表面フォノン,吸着子の束縛振動,分子凝集系など


6. IRAS/ATR & SPA-LEED at LT (A378)
IRAS (Bruker, MCT&SiB detector=400~5000cm-1), SPA-LEED (Omicron), QMS etc.
Sample temperature=20K~1200K

研究対象:表面原子・分子集団の構造と分子内振動,分子凝集系表面の化学(特に水分子,氷表面の化学)


7. UHV STM (A037)
SPECS STM-150
Sample temperature=90K~300K

研究対象:金属表面における原子・分子の吸着,反応,成長.表面超構造.

8. LT-STM/STS (A036)
CREATEC
Temperature: 6 K, 77 K, 300 K

研究対象: 金属表面および吸着原子・分子のSTM/STS

9. Independently driven micro 4-probe measurement
Unisoku 4-probe head and home-made electronics

研究対象:半導体表面や有機薄膜の電気伝導測定

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